Advanced Photon Source

An Office of Science National User Facility

X-ray Laue Diffraction Microscopy in 3D at 34-ID-E, APS - Introduction

Beamline Phone Number: (630) 252-1834

Welcome to the X-ray Laue Diffraction Microscopy facility at the Advanced Photon Source!

34-ID-E is an undulator beamline dedicated for X-ray micro/nano-diffraction activities at the Advanced Photon Source of the Argonne National Laboratory.

The x-ray micro/nano-diffraction facility produces x-ray beams that are routinely 0.3µm x 0.3µm or better for use in diffraction techniques using Kirkpatrick-Baez (K-B) focusing mirrors. The specially designed micro-monochromator allows the selection of either polychromatic or monochromatic conditions with a fixed focal spot on the sample.

Polychromatic x-ray microscopy utilizes Laue diffraction method to characterize crystalline structure in materials. With scanning technique and newly developed differential aperture techniques, spatially resolved microdiffraction measurements can be made in two or three dimensions with submicron resolution. Properties that can be measured include the local crystalline phase, local texture (orientation), and the local strains.

The development of the microbeam experimental capabilities were sponsored by the DOE Office of Basic Energy Sciences.